Ion Coupled Plasma
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Inductively coupled plasma — An inductively coupled plasma (ICP) is a type of plasma source in which the energy is supplied by electrical currents which are produced by electromagnetic induction, that is, by time varying magnetic fields. [A. Montaser and D. W. Golightly, eds … Wikipedia
Inductively coupled plasma mass spectrometry — ICP MS Instrument Acronym ICP MS Classification Mass spectrometry Analytes atomic and polyatomic species in plasma, with exceptions; usually inte … Wikipedia
Inductively coupled plasma atomic emission spectroscopy — (ICP AES), also referred to as inductively coupled plasma optical emission spectrometry (ICP OES), is an analytical technique used for the detection of trace metals. It is a type of emission spectroscopy that uses the inductively coupled plasma… … Wikipedia
Plasma-immersion ion implantation — (PIII) [cite book | title = Materials Science of Thin Films | author = Milton Ohring | publisher = Academic Press | year = 2002 | isbn = 0125249756 | url = http://books.google.com/books?id=SOt yFjV xwC pg=PA267… … Wikipedia
Plasma source — Plasma sources generate plasmas. Excitation of a plasma requires partial ionization of neutral atoms and/or molecules of a medium. There are several ways to cause ionization:collisions of energetic particles, strong electric fields acting on bond … Wikipedia
Plasma-Physik — Plasma in einer Plasmalampe. Datei:Gerds plasma.jpg magnetisch verformtes Plasma Sonne … Deutsch Wikipedia
Plasma (Physik) — Plasma in einer Plasmalampe Magnetisch verformtes Plasma … Deutsch Wikipedia
Plasma (physics) — For other uses, see Plasma. Plasma lamp, illustrating some of the more complex phenomena of a plasma, including filamentation. The colors are a result of relaxation of electrons in excited states to lower energy states after they have recombined… … Wikipedia
Ion source — An ion source is an electro magnetic device that is used to create charged particles. These are used primarily within mass spectrometers or particle accelerators.Mass spectrometry In mass spectrometry, an ion source is a piece of equipment used… … Wikipedia
Plasma nitriding — or ion nitriding (sometimes also called plasma ion nitriding) or glow discharge nitriding, is an industrial surface hardening treatment for metallic materials.DescriptionA plasma is the fourth state of matter, the other three being solid, liquid… … Wikipedia
Reactive-ion etching — (RIE) is an etching technology used in microfabrication. It uses chemically reactive plasma to remove material deposited on wafers. The plasma is generated under low pressure (vacuum) by an electromagnetic field. High energy ions from the plasma… … Wikipedia
